Aller au menu Aller au contenu
Centre for Radiofrequencies, Optic and Micro-nanoelectronics in the Alps

> Platforms > Technology

Wet etching, Dry etching, Chemistry, Nanomaterials activities

Wet etching :

  • Etching of : Al, Cr, Au, SiO2, Al2O3…
  • Fume hood for use of acids (HF, HCL ...) and solvents
  • Weighing machine
  • Ultrasonic bath
  • Hot plates
  • Thermoreguled bathes
    Hot plate Fume hoods for acid or solvent etching

Dry etching :

Equipment RIE/ ICP Corial 200IL
  • Etching of thin layers by fluoric gazes, O2 plasma (resist etching), surface activation
  • Gazes : CHF3, SF6, C2H4, O2.
    RIE equipment Corial 200IL RIE equipment Corial 200IL

Nanomaterials activities:

  • Growth
  • Preparation of solution of nanomaterials in suspension in liquids and in polymers
  • Work under fume hood or glove compartment

Others equipements available:

  • Ovens
  • Vacuum ovens
  • Fan convection laboratory oven
  • Optical mircoscope  Leica INM100 : Magnification : max. 1000, Image acquisition
  • Spin rince dryer  Semitool to clean and dry samples
  • Polishing machine for molecular adhesion- MECAPOL P220U
Surface activation         Optical microscope Leica                      

Date of update May 23, 2019

Grenoble site
Grenoble INP - Minatec : 3, Parvis Louis Néel - CS 50257 - 38016 Grenoble Cedex 1

Chambery site
Université Savoie Mont Blanc - Rue Lac de la Thuile, Bat. 21 - 73370 Le Bourget du Lac
République Française         Logo CNRS_2019        Logo Grenoble INP - UGA   Grenoble Alps University    Université Savoie Mont Blanc
Université Grenoble Alpes